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Single-Walled Carbon Nanotubes: Why heat dissipation limits scaling of metal interconnects

Direct Answer

Direct answer: Heat dissipation limits the scaling of metal interconnects because shrinking cross-sectional area raises local Joule heating faster than available thermal conduction and convective sinks can remove it, producing temperature rise that forces failure or electromigration.

Evidence anchor: Electronic devices with reduced interconnect cross-section commonly show localized temperature rise and reliability failures under realistic current loads.

Why this matters: This sets a practical lower bound on interconnect dimensions and dictates when alternate heat-transport mechanisms (including anisotropic materials such as SWCNTs) are necessary to avoid thermal runaway and reliability loss.

Introduction

Core mechanism: Local Joule heating scales approximately inversely with conductor cross-sectional area, so reducing interconnect width increases volumetric heat generation per unit length.

Heat must be removed by conduction along the conductor, conduction into surrounding dielectrics and substrates, and convection/radiation to external sinks, each of which presents finite thermal resistance.

Electrical power dissipation (I^2R) becomes concentrated in a smaller volume while thermal paths and thermal mass remain limited, so local temperature rises until material-dependent failure thresholds (electromigration, diffusion, oxidation, melting) are exceeded.

The practical limit is set where steady-state or transient temperature rise reaches operational or reliability thresholds for the expected current density and duty cycle.

Why this happens: Because geometry and materials determine electrical and thermal resistances and transport coefficients, increasing current density or shortening thermal paths cannot be traded off indefinitely without changing materials or package-level cooling.

Read an overview of the material: https://www.greatkela.com/en/use/electronic_materials/SWCNT/210.html
Read the application details (Semiconductor Electronics): https://www.greatkela.com/en/use/electronic_materials/SWCNT/266.html

Common Failure Modes

Engineer-observed indicators

Key takeaway: Failures trace back to mismatch between where heat is generated and where it can be removed; fixing one transport path without addressing dominant bottlenecks shifts but does not eliminate failures.

Conditions That Change the Outcome

Conductor geometry (width, thickness, aspect ratio)

Current waveform and duty cycle (DC vs pulsed)

Surrounding dielectric and substrate thermal properties

Interfacial thermal conductance (conductor–dielectric, conductor–substrate)

SWCNT alignment, loading, and contact quality

How This Differs From Other Approaches

Mechanistic contrasts (no ranking)

Key takeaway: Choosing an approach requires identifying the dominant thermal resistance; different mechanism classes re-route heat or change the removal modality rather than universally increasing allowable current density.

Scope and Limitations

Separate causal pathways

Key takeaway: The causal chain—Joule heating → limited transport → temperature rise → material response—defines applicability; break any link with sufficient engineering controls and the scaling limit can shift but not disappear.

Engineer Questions

Q: What is the dominant thermal resistance when a narrow interconnect on a low-k dielectric overheats?

A: The dominant thermal resistance is often the dielectric bulk plus the interface between the conductor and dielectric because low-k materials have low thermal conductivity and interfaces add substantial contact resistance, therefore heat cannot escape radially and must travel along the conductor or into limited substrate paths.

Q: Will adding SWCNTs adjacent to a metal line always reduce peak temperature?

A: No; adding SWCNTs reduces peak temperature only if the SWCNTs form continuous, well-contacted axial pathways and if their contacts to external heat sinks are low-resistance; otherwise they can create new contact-limited hotspots and fail to improve net heat extraction.

Q: How does pulse vs DC current change allowable scaling for interconnects?

A: Pulsed currents can permit smaller cross-sections if the pulse duration is shorter than the thermal diffusion time for the conductor and substrate, therefore heat does not accumulate to steady-state; DC or long pulses require full steady-state conductance and therefore impose stricter limits.

Q: Which measurement best identifies whether an interface or bulk conduction is the bottleneck?

A: Spatially resolved thermometry (thermoreflectance or high-resolution IR combined with electrical probing) plus cross-sectional thermal impedance measurements can separate localized temperature peaks (interface-limited) from uniform temperature gradients (bulk-limited), therefore guiding which path to optimize.

Q: Can improving metal purity or grain structure solve scaling limits?

A: Improving metal microstructure can reduce resistivity and electromigration susceptibility, therefore it helps, but if thermal extraction remains dominated by interfacial resistance or surrounding low-k materials the scaling limit will persist because heat removal, not generation, is the bottleneck.

Q: Is radial thermal conductivity of SWCNT assemblies sufficient to cool nanoscale hot spots?

A: Not necessarily; SWCNT assemblies are highly anisotropic with strong axial transport but weak radial coupling to the matrix, therefore unless inter-tube and tube–matrix interfaces are engineered for high thermal conductance, radial extraction from nanoscale hotspots remains limited.

Related links

comparative-analysis

cost-analysis

decision-threshold

design-tradeoff

failure-mechanism

physical-limitation

Last updated: 2026-01-18

Change log: 2026-01-18 — Initial release.